Photoresist Systems (Table 1)

Irradiation Type

• Polymer Base (PB)
• Solvent (S)
• Developer (D)

1. Ultraviolet
   1. Near (350 - 450 nm.)
      1. Negative

         PB - Azide Base - aliphatic rubber (isoprene)
         S - n-butyl acetate, xylene, cellosolve acetate, ethyl benzene
         D - xylene, aliphatic hydrocarbons, n-butyl acetate, cellosolve acetate, stoddard solvent (petroleum distellates)

      2. Positive

         PB - ortho-diazoketone
         S - cellosolve acetate, n-butyl acetate, xylene, chlorotoluene
         D - sodium hydroxide, silicates, potassium hydroxide

   2. Deep (2000- 250 nm.)

      Primarily positive resists

2. Electron-Beam (∼ 100 nm.)
   1. Negative

      PB - copolymer-ethyl acrylate and glycidylmethacrylate (COP)
      S - n/a
      D - n/a

   2. Positive

      PB - polymethylmethacrylate, polyfluoralkylmethacrylate, polyalkylaldehyde, poly-cyano ethylacrylate
      S - n/a
      D - alkaline or isopropyl alcohol (IPA), ethyl acetate, or methyl isobutyl ketone (MIBK)

3. X-ray (0.5 - 5 nm.)
   1. Negative

      PB - co-polymer-ethyl acrylate and glycidyl methacrylate (COP)
      S - n/a
      D - n/a

   2. Positive

      PB - polymethylmethacrylate, ortho-diazoketone, poly (hexafluorobutylmethacrylate), poly (butene - 1 - sulfone)
      S - n/a
      D - n/a