Photoresist Strippers (Table 4)

Wet Chemical

• Acid
  1. Sulfuric (H₂SO₄) and Chromic (CrO₃)
  2. Sulfuric (H₂SO₄) and Ammonium Persulfate ((NH₄)₂S₂O₈)
  3. Sulfuric (H₂SO₄) and Hydrogen Peroxide (H₂O₂)
• Organics
  1. Phenols, sulfonic acids, trichlorobenzene, perchloroethylene
  2. Glycol ethers, ethanolamine, triethanolamine
  3. Sodium hydroxide and silicates (positive resist)

Dry Chemical

• Plasma Ashing (Stripping)
  1. RF (radio frequency) power source - 13.56 MHz frequency
  2. Oxygen (O₂) source gas
  3. Oil lubricated vacuum pump system with liquid nitrogen trap